Mask aligner EM-5026M1

Sector: Optics-mechanical Equipment
Price: Contract Price
Full Product Information:
EM-5026M1 system is designed to align the photomask pattern with the wafer (substrate) pattern and to transfer the pattern from the photomask onto the wafer through contact (proximity) exposure of the wafer (substrate) photoresist layer. EM-5026M1 features the following automatic systems: - wafer wedge and thickness compensation without contact with the photomask; - alignment proximity control; - wafer photoresist exposure; - energy saving mode. Single field microscope with smooth magnification adjustment. Loading-unloading of wafers and substrates onto the chuck is performed by the operator manually.

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