Multichannel laser pattern generator EM-5589

Sector: Optics-mechanical Equipment
Price: Contract Price
Full Product Information:
DUV-based EM-5589 generator is intended for fabrication of 65 nm node VLSI photomasks as well as direct writing on wafers in 250 nm node microelectronics fabrication. Along with mask fabrication on blanks made of quartz and optical glass, the generator enables direct IC pattern writing on wafers made of various materials, i.e. maskless process. The generator enables 65 nm node mask fabrication and has the following additional capabilities: - Phase-shift mask fabrication; - Mask fabrication based on double masking process; - OPC mask fabrication.

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